Role of Bloch mode reshaping and disorder correlation length on scattering losses in slow-light photonic crystal waveguides

Nishan Mann, Mark Patterson, and Stephen Hughes
Phys. Rev. B 91, 245151 – Published 25 June 2015

Abstract

Intrinsic disorder in photonic crystal waveguides occurs via rapid fluctuations of the air-dielectric interface and is typically characterized by a quadratic mean surface roughness and a surface correlation length. We theoretically study the impact of correlation length on extrinsic scattering losses and discuss the numerical implementation for several different waveguide designs. The role of correlation length is found to be strongly influenced by the underlying Bloch modes which are dependent on waveguide design and frequency, and can thus be partly controlled via spatial-dispersion engineering. For most frequencies and waveguide designs, we find an asymptotical increase in losses as the correlation length increases; however, we show that for some frequencies and designs, a maximum scattering loss is achieved for a finite correlation length. Our results also demonstrate the importance of choosing an appropriate correlation function for modeling quickly varying disorder.

  • Figure
  • Figure
  • Figure
  • Figure
  • Figure
  • Figure
  • Figure
  • Received 24 October 2014
  • Revised 4 May 2015

DOI:https://doi.org/10.1103/PhysRevB.91.245151

©2015 American Physical Society

Authors & Affiliations

Nishan Mann*, Mark Patterson, and Stephen Hughes

  • Department of Physics, Queen's University, Kingston, Ontario, Canada K7L 3N6

  • *nmann@physics.queensu.ca

Article Text (Subscription Required)

Click to Expand

References (Subscription Required)

Click to Expand
Issue

Vol. 91, Iss. 24 — 15 June 2015

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×