Extraordinary Hall effect in Ba1xSrxRuO3 films

Y. Kobayashi, M. Iwata, T. Kaneko, K. Sato, K. Asai, and H. Ohsumi
Phys. Rev. B 82, 174430 – Published 22 November 2010

Abstract

We have investigated the extraordinary Hall effect of Ba1xSrxRuO3 thin films with x=1 and 0.8. For x=1, the extraordinary Hall resistivity can be interpreted by the skew scattering mechanism in the paramagnetic region above about 160 K. In the ferromagnetic region above about 60 K, the extraordinary Hall coefficient Rs can be expressed by the combination of the skew and the side-jump scattering mechanisms as Rs=aρ+bρ2 using the electrical resistivity ρ, as usually observed in ordinary ferromagnetic metals. Below 60 K, the field dependence of the Hall resistivity ρH at intermediate field region cannot be expressed as ρH=R0B+RsM, suggesting an additional term in the field dependence of the extraordinary Hall resistivity. Rs below 60 K derived from the high field region does not follow the relation Rs=aρ+bρ2, suggesting that the coefficients a and b of the skew and the side-jump scattering depends on temperature below 60 K. On the other hand in the sample with x=0.8, no anomalies were observed below 60 K both in temperature and field dependence. According to the structural analysis of the samples, we infer that the modulation of the Fermi surface due to the structural change plays an important roll on the anomaly of the temperature dependence of the extraordinary Hall effect for x=1.

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  • Received 18 August 2010

DOI:https://doi.org/10.1103/PhysRevB.82.174430

©2010 American Physical Society

Authors & Affiliations

Y. Kobayashi*, M. Iwata, T. Kaneko, K. Sato, and K. Asai

  • Department of Applied Physics and Chemistry, The University of Electro-Communications, Chofu, Tokyo 182-8585, Japan

H. Ohsumi

  • RIKEN SPring-8 Center, Sayo, Hyogo 679-5148, Japan

  • *Also at Department of Physics, Tokyo Medical University, Shinjuku-ku 6-1-1, Tokyo 160-8402, Japan; koba@tokyo-med.ac.jp

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Vol. 82, Iss. 17 — 1 November 2010

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