Low-temperature dissociative adsorption of H on W, Mo, and Ta surfaces studied with mechanically controllable break-junctions

D. den Boer, O. I. Shklyarevskii, J. A. A. W. Elemans, and S. Speller
Phys. Rev. B 77, 165423 – Published 18 April 2008

Abstract

We used the mechanically controllable break-junction technique to study the consecutive stages of interaction of hydrogen molecules with surfaces of W, Mo, and Ta at 4.2–6 K. This includes the physical adsorption of H2 molecules, their subsequent chemisorption, their dissociation, and the diffusion of protons into the bulk of the materials. The quantum diffusion is accompanied by 1/fα contact resistance noise. For tantalum hydride TaHx, we found a 10% increase of the critical temperature Tc with respect to pure Ta.

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  • Received 26 November 2007

DOI:https://doi.org/10.1103/PhysRevB.77.165423

©2008 American Physical Society

Authors & Affiliations

D. den Boer1, O. I. Shklyarevskii1,2, J. A. A. W. Elemans1, and S. Speller1

  • 1Institute for Molecules and Materials, Radboud University of Nijmegen, Toernooiveld 1, NL-6525 ED Nijmegen, The Netherlands
  • 2B. Verkin Institute for Low Temperature Physics & Engineering, National Academy of Science of Ukraine, 47 Lenin Avenue, 61103 Kharkov, Ukraine

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Vol. 77, Iss. 16 — 15 April 2008

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