Valley Kondo effect in silicon quantum dots

Shiue-yuan Shiau, Sucismita Chutia, and Robert Joynt
Phys. Rev. B 75, 195345 – Published 31 May 2007

Abstract

Recent progress in the fabrication of quantum dots using silicon has opened the prospect of observing the Kondo effect associated with a valley degree of freedom. We compute the dot density of states using an Anderson model with infinite Coulomb interaction U, whose structure mimics the nonlinear conductance through a dot. The density of states is obtained as a function of temperature and applied magnetic field in the Kondo regime using an equation-of-motion approach. We show that there is a very complex peak structure near the Fermi energy, with several signatures that distinguish this spin-valley Kondo effect from the usual spin Kondo effect seen in GaAs dots. We also show that the valley index is generally not conserved when electrons tunnel into a silicon dot, though the extent of this nonconservation is expected to be sample dependent. We identify features of the conductance that should enable experimenters to understand the interplay of Zeeman splitting and valley splitting, as well as the dependence of tunneling on the valley degree of freedom.

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  • Received 15 January 2007

DOI:https://doi.org/10.1103/PhysRevB.75.195345

©2007 American Physical Society

Authors & Affiliations

Shiue-yuan Shiau1, Sucismita Chutia1, and Robert Joynt1,2

  • 1Department of Physics, University of Wisconsin, 1150 University Avenue, Madison, Wisconsin 53706, USA
  • 2Deaprtment of Physics, University of Hong Kong, Hong Kong, China

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Issue

Vol. 75, Iss. 19 — 15 May 2007

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