Evidence of postdeposition nucleation in organic molecular thin films

G. Berlanda; M. Campione; M. Moret; A. Sassella; A. Borghesi

doi:10.1103/PhysRevB.69.085409

Evidence of postdeposition nucleation in organic molecular thin films

G. Berlanda, M. Campione, M. Moret, A. Sassella, and A. Borghesi

Phys. Rev. B 69, 085409 – Published 20 February 2004

Abstract

We analyze the growth of 1-nm-thick films of an organic molecule grown on silica by means of molecular beam deposition. Samples were deposited at a constant rate over a very wide substrate temperature range. By an ex situ atomic force microscopy study two main behaviors are revealed: for samples deposited below 200 K the density of islands is temperature independent and is demonstrated to arise from postnucleation phenomena; above 200 K island density scales with temperature following an Arrhenius law, allowing us to estimate an energy barrier for monomer diffusion of $(0.122 \pm 0.011) eV .$

Received 5 September 2003

DOI:https://doi.org/10.1103/PhysRevB.69.085409

Authors & Affiliations

G. Berlanda^1,*, M. Campione^2,†, M. Moret¹, A. Sassella², and A. Borghesi²

¹Dipartimento di Scienza dei Materiali, Università di Milano Bicocca, via Cozzi 53, 20125 Milano, Italy
²Istituto Nazionale per la Fisica della Materia and Dipartimento di Scienza dei Materiali, Università di Milano Bicocca, via Cozzi 53, 20125 Milano, Italy

^*Corresponding author. Electronic address: berlanda@mater.unimib.it
^†Corresponding author. Electronic address: marcello.campione@mater.unimib.it

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Vol. 69, Iss. 8 — 15 February 2004

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