Fractional van der Waals interaction between thin metallic films

M. Boström and Bo E. Sernelius
Phys. Rev. B 61, 2204 – Published 15 January 2000
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Abstract

The van der Waals (vdW) interaction between thin metallic films varies with separation as the separation to a fractional power. This is in contrast to the usual integer-power separation dependence between objects such as atoms, dielectric films, or thick metallic films. We have calculated the free energy of attraction between sheets of gold, silver, copper, beryllium, and tungsten numerically using experimentally found dielectric functions. The results are compared with the corresponding analytical results obtained using simple model dielectric functions. We have investigated how thin the metallic films must be in order for the fractional vdW interaction to be present. To our knowledge, fractional vdW interaction has not yet been confirmed experimentally.

  • Received 19 July 1999

DOI:https://doi.org/10.1103/PhysRevB.61.2204

©2000 American Physical Society

Authors & Affiliations

M. Boström and Bo E. Sernelius

  • Department of Physics and Measurement Technology, Linköping University, S-581 83 Linköping, Sweden

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Vol. 61, Iss. 3 — 15 January 2000

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