Cyclotron emission from quantized Hall devices: Injection of nonequilibrium electrons from contacts

Y. Kawano, Y. Hisanaga, and S. Komiyama
Phys. Rev. B 59, 12537 – Published 15 May 1999
PDFExport Citation

Abstract

Emissions of cyclotron radiation associated with the inter-Landau-level transition of nonequilibrium electrons are experimentally studied in quantum-Hall-effect devices. It is confirmed that both the longitudinal resistance and the contact resistance are vanishing when the cyclotron emission (CE) is being observed. For the CE, a critical source-drain voltage VSD is found to exist at VSD=ħωc/2e, where ħωc is the inter-Landau-level energy spacing. Spatially resolved measurements reveal that the CE takes place at both of the current entry and exit corners (“hot spots”) of the Hall bars. A model of ideal current contacts is discussed. The CE on the source side is interpreted as being due to injection of nonequilibrium electrons from the source contact, and the CE on the drain side as due to an inter-Landau-level electron tunneling caused by a steep potential wall formed at the drain contact.

  • Received 12 October 1998

DOI:https://doi.org/10.1103/PhysRevB.59.12537

©1999 American Physical Society

Authors & Affiliations

Y. Kawano and Y. Hisanaga*

  • Department of Basic Science, University of Tokyo, Komaba 3-8-1, Meguro-ku, Tokyo 153-8902, Japan

S. Komiyama

  • Department of Basic Science, University of Tokyo, Komaba 3-8-1, Meguro-ku, Tokyo 153-8902, Japan
  • Japan Science and Technology Corporation (JST), Tokyo, Japan

  • *Present address: NEC Optoelectronics and High Frequency Device Research Laboratories, Miyukigaoka 34, Tukuba-shi, Ibaraki 305-8501, Japan.

References (Subscription Required)

Click to Expand
Issue

Vol. 59, Iss. 19 — 15 May 1999

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×