Vacancy kinetics and sputtering of GaAs(110)

R. J. Pechman, X.-S. Wang, and J. H. Weaver
Phys. Rev. B 51, 10929 – Published 15 April 1995
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Abstract

Bombardment of GaAs(110) at 300≤T≤775 K with Ar+ ions at normal incidence creates surface-layer defects that generally span one or two unit cells, as shown by scanning tunneling microscopy. Vacancies produced in this way diffuse via thermal activation to form single-layer vacancy islands. The diffusion of divacancies favors [11¯0] and accommodation at islands produces roughly isotropic islands. Modeling of growth showed an overall Arrhenius behavior for diffusion with an activation energy of 1.3±0.2 eV. Investigations of the surface morphology during multilayer erosion revealed deviation from layer-by-layer removal with scaling exponents between 0.4 and 0.5 for 626≤T≤775 K.

  • Received 16 January 1995

DOI:https://doi.org/10.1103/PhysRevB.51.10929

©1995 American Physical Society

Authors & Affiliations

R. J. Pechman, X.-S. Wang, and J. H. Weaver

  • Department of Materials Science and Chemical Engineering, University of Minnesota, Minneapolis, Minnesota 55455

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Vol. 51, Iss. 16 — 15 April 1995

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