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Enhanced band-gap luminescence in strain-symmetrized (Si)m/(Ge)n superlattices

U. Menczigar, G. Abstreiter, J. Olajos, H. Grimmeiss, H. Kibbel, H. Presting, and E. Kasper
Phys. Rev. B 47, 4099(R) – Published 15 February 1993
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Abstract

We report on band-gap luminescence in strain-symmetrized, (Si)m/(Ge)n superlattices grown on a step-graded, alloy buffer with a reduced dislocation density, using Sb as a surfactant. The luminescence efficiency for a (Si)9/(Ge)6 and (Si)6/(Ge)4 superlattice is strongly enhanced compared with a corresponding Si0.6Ge0.4 alloy reference sample. The luminescence signals can be attributed to interband transitions of excitons localized at potential fluctuations in the superlattice. The observed systematic shift of the band-gap luminescence to lower energies with increasing period length compares well with results of a simple, effective-mass calculation. An increasing superlattice band gap and a reduction in luminescence intensity is observed if the Si and Ge layers are interdiffused by thermal annealing. The band gap for a (Si)6/(Ge)4 superlattice was also measured with absorption spectroscopy. The absorption coefficient, as determined by direct transmission, is in the order of 103 cm1 about 0.1 eV above the band gap.

  • Received 25 November 1992

DOI:https://doi.org/10.1103/PhysRevB.47.4099

©1993 American Physical Society

Authors & Affiliations

U. Menczigar and G. Abstreiter

  • Walter-Schottky-Institut, Technische Universitat München, Am Coulombwall, D-8046 Garching, Germany

J. Olajos and H. Grimmeiss

  • Department of Solid State Physics, University of Lund, Box 118, S-221 00 Lund, Sweden

H. Kibbel, H. Presting, and E. Kasper

  • Daimler Benz AG, Forschungszentrum, Wilhelm Runge Strasse 11, D-7800 Ulm, Germany

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Vol. 47, Iss. 7 — 15 February 1993

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