Scaling analysis of diffusion-mediated island growth in surface adsorption processes

M. C. Bartelt and J. W. Evans
Phys. Rev. B 46, 12675 – Published 15 November 1992
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Abstract

We examine the competition between diffusion-mediated irreversible nucleation and growth of islands during submonolayer deposition on perfect substrates. We provide a detailed scaling theory for the complete distribution of island sizes and separations, both with the ratio of diffusion to deposition rate and with time. Scaling functions and exponents are obtained by simulation. The leading scaling behavior is independent of details of the island structure. These results are supplemented by an analysis of rate equations for the island-size distribution whose unconventional form appropriately describes island nucleation and growth mechanisms. The exponents agree with the simulations and the island-size distribution shows qualitative agreement. We further provide simulation results for the scaling of the island-separation distribution, quantifying, in particular, the depletion in the concentration of pairs of islands at small separations.

  • Received 19 May 1992

DOI:https://doi.org/10.1103/PhysRevB.46.12675

©1992 American Physical Society

Authors & Affiliations

M. C. Bartelt

  • Institute for Physical Research and Technology, Iowa State University, Ames, Iowa 50011

J. W. Evans

  • Department of Mathematics, Iowa State University, Ames, Iowa 50011
  • Ames Laboratory, Iowa State University, Ames, Iowa 50011

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Vol. 46, Iss. 19 — 15 November 1992

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