Freely-migrating-defect production during irradiation at elevated temperatures

T. Hashimoto, L. E. Rehn, and P. R. Okamoto
Phys. Rev. B 38, 12868 – Published 15 December 1988
PDFExport Citation

Abstract

Radiation-induced segregation in a Cu1 at. % Au alloy was investigated using in situ Rutherford backscattering spectrometry. The amount of Au atom depletion in the near surface region was measured as a function of dose during irradiation at 350 °C with four ions of substantially different masses. Relative efficiencies for producing freely migrating defects were evaluated for 1.8-MeV H1, He4, Ne20, and Kr84 ions by determining beam current densities that gave similar radiation-induced segregation rates. Irradiations with primary knock-on atom median energies of 1.7, 13, and 79 keV yielded relative efficiencies of 53, 7, and 6 %, respectively, compared to the irradiation with a 0.83-keV median energy. Despite quite different defect and host alloy properties, the relative efficiencies for producing freely migrating defects determined in Cu-Au are remarkably similar to those found previously in Ni-Si alloys. Hence, the reported efficiencies appear to offer a reliable basis for making quantitative correlations of microstructural changes induced in different alloy systems by a wide variety of irradiation particles.

  • Received 15 August 1988

DOI:https://doi.org/10.1103/PhysRevB.38.12868

©1988 American Physical Society

Authors & Affiliations

T. Hashimoto

  • Energy Research Laboratory, Hitachi Ltd., 1168 Moriyamacho, Hitachi, Ibaraki 316, Japan

L. E. Rehn and P. R. Okamoto

  • Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439

References (Subscription Required)

Click to Expand
Issue

Vol. 38, Iss. 18 — 15 December 1988

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×