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Sb/GaAs(110) interface: A reevaluation

F. Schäffler, R. Ludeke, A. Taleb-Ibrahimi, G. Hughes, and D. Rieger
Phys. Rev. B 36, 1328(R) – Published 15 July 1987
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Abstract

The influence of thermal annealing on Sb/GaAs(110) interfaces is studied in situ by high-resolution photoemission spectroscopy. A detailed line-shape analysis of the Sb 4d core-level spectra shows that Sb deposition at room temperature (RT) does not lead to perfectly ordered growth of the first monolayer (ML), as was assumed so far. Annealing at 330 °C results in a highly ordered overlayer that is desorption limited to 1 ML. The degree of order affects the barrier height at the interface drastically: While RT deposition pins the Fermi level 0.6 eV above valence-band maximum for p-type GaAs, we find a reduction in the band bending by a factor of 2 after annealing.

  • Received 27 March 1987

DOI:https://doi.org/10.1103/PhysRevB.36.1328

©1987 American Physical Society

Authors & Affiliations

F. Schäffler, R. Ludeke, A. Taleb-Ibrahimi, G. Hughes, and D. Rieger

  • IBM Thomas J. Watson Laboratory, P.O. Box 218, Yorktown Heights, New York 10598

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Vol. 36, Iss. 2 — 15 July 1987

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