Determination of the frequency-dependent resistivity of ultrathin metallic films on Si(111)

B. N. J. Persson and J. E. Demuth
Phys. Rev. B 31, 1856 – Published 15 February 1985
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Abstract

Inelastic electron scattering is used to determine the frequency-dependent resistivity of ultrathin metallic films on Si(111). The experimental data are analyzed in the single-scattering regime using dipole scattering theory. An unusual frequency dependence of the resistivity is found for low coverages of Pd on Si(111) and analyzed using the Bruggeman effective-medium theory. This analysis together with hydrogen-titration studies indicates the presence of metallic clusters embedded in the surface. We also show that electron tunneling via surface states gives an important contribution to the dc conductivity of these ultrathin granular metal films on Si(111).

  • Received 13 August 1984

DOI:https://doi.org/10.1103/PhysRevB.31.1856

©1985 American Physical Society

Authors & Affiliations

B. N. J. Persson

  • Institut für Festkörperforschung der Kernforschungsanlage Jülich, D-5170 Jülich, West Germany

J. E. Demuth

  • IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598

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Issue

Vol. 31, Iss. 4 — 15 February 1985

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