Screening of hot-carrier relaxation in highly photoexcited semiconductors

Ellen J. Yoffa
Phys. Rev. B 23, 1909 – Published 15 February 1981
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Abstract

The carrier density dependence of the hot-carrier energy relaxation rate in highly photoexcited semiconductors is investigated. Results of these calculations indicate important differences between polar direct-gap and nonpolar indirect-gap materials. The critical carrier density (Nc) for the onset of screening in polar semiconductors is found to increase with both effective mass and phonon energy. A method for predicting trends among these materials with respect to Nc is briefly described. Calculations for GaAs predict that the hot-carrier cooling rate begins to decrease at Nc6×1016 cm3. Above this density the phonon emission frequency falls rapidly. In contrast, the effects of screening in Si are shown to be negligible for N1019 cm3. In this case, a significant reduction in the energy relaxation rate does not occur until N1021 cm3.

  • Received 2 September 1980

DOI:https://doi.org/10.1103/PhysRevB.23.1909

©1981 American Physical Society

Authors & Affiliations

Ellen J. Yoffa

  • IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598

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Issue

Vol. 23, Iss. 4 — 15 February 1981

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