Heat Transfer During Radio Frequency Inductively Coupled Plasma Deposition of Tungsten

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Published under licence by IOP Publishing Ltd
, , Citation Jiang Xianliang and M I Boulos 2007 Plasma Sci. Technol. 9 427 DOI 10.1088/1009-0630/9/4/09

1009-0630/9/4/427

Abstract

Particle melting and substrate temperature are important in controlling deposited density and residual stress in thermal plasma deposition of refractory materials. In this paper, both the heating and cooling behaviours of tungsten particles inside a radio frequency inductively coupled plasma (ICP) and the plasma heat flux to the substrate were investigated. The distribution of the plasma-generated heat on device, powder injection probe, deposition chamber, and substrate was determined by measuring the water flow rate and the flow-in and flow-out water temperatures in the four parts. Substrate temperature was measured by a two-colour pyrometer during the ICP deposition of tungsten. Experimental results show that the heat flux to the substrate accounts for about 20% of the total plasma energy, the substrate temperature can reach as high as 2100 K, and the heat loss by radiation is significant in the plasma deposition of tungsten.

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10.1088/1009-0630/9/4/09