Measured Stark Widths and Shifts of Neutral Silicon Spectral Lines

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Published under licence by IOP Publishing Ltd
, , Citation A Srećković et al 1998 Phys. Scr. 57 225 DOI 10.1088/0031-8949/57/2/012

1402-4896/57/2/225

Abstract

Stark widths and shifts of five Si I line were measured at 28500 K electron temperature and 1.9 × 1023m-3 electron density in a linear, low-pressure, pulsed arc operated in argon-helium mixture. Our data are compared with values calculated on the basis of quasistatic approximation.

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10.1088/0031-8949/57/2/012