In-plane imperfections in GaN studied by x-ray diffraction

We have studied a series of GaN films grown with a range of dislocation densities by atomic force microscopy (AFM), transmission electron microscopy (TEM) and high resolution x-ray diffraction (HRXRD). The (002), (004), (006), (105), (204), (302), (100), (110), (200) and (300) reflections were measured as reciprocal space maps (RSMs) or scans in ω and ω/2θ. The latter 4 in-plane reflections were measured using a low, or glancing, incident angle with respect to the film surface. We have used a variety of different methods to try and obtain reliable measurements for mosaic tilt, twist, crystallite size and microstrain both in- and out-of plane. From (hk0) data in-plane twist angles were measured ranging from 0.37° to 0.078° and in-plane microstrains from 3.5 × 10⁻⁴ to 1.8 × 10⁻⁴. The improvements in the quality of the GaN layers relate to the increased island coalescence time, which reduces in particular the number of edge-type threading dislocations. The first three samples had a much larger tilt ∼0.09° than the last three ∼0.04°. However, the latter samples were bowed, so results from a single measurement on the (002) peak are too large. Beam restriction on the (002) or an extrapolation from several (00l) reflections gives more reliable results. The values obtained for in-plane crystallite size are in general variable or unreliable. For some samples the sizes are considered to be too large to be accessible by XRD; in most cases the peak broadening is dominated by tilt or twist or microstrain and the results are sensitive to assumptions about the peak shape. For the samples with smaller measurable crystallite sizes, the (hk0) peaks were too weak to measure reliably. The cell parameters showed more compressive strain with fewer dislocations. The trends observed by HRXRD are consistent with AFM and TEM results.