Analysis of Spectroscopy: Mustard Greens Leaf of Chlorophyll as a Ba_0.2Sr_0.8TiO₃ (Barium Strontium Titanate) Film Dopant

In this paper, [Inline formula] deposition method with spin coating technique in order to improve its dielectric properties. This study was to find out how the effect of mustard chlorophyll exposure on [Inline formula] films was analyzed using x-ray diffraction and micro-Raman spectroscopy based on crystal structure and the stability of the film phase BST doping mustard chlorophyll. The annealing process is carried out as a high temperature heating step which aims to restore the physical and crystalline properties of the film which may change during the film growth process. The specified annealing temperature is 850 °C with a holding time of 8 h. The effect of chlorophyll solidification was observed by applying variations of chlorophyll mustard concentration, namely 0%, 2.5%, and 5%. The crystal structure type and film lattice parameters were confirmed using X-Ray Diffraction with the measurement angle starting from an angle of 10° to 80° with an angle increase of 0.02°.