We present a pulsed laser deposition system that can monitor growth by simultaneously using in situ optical spectroscopic ellipsometry (SE) and reflection high-energy electron diffraction (RHEED). The RHEED precisely monitors the number of thin-film layers and surface structure during the deposition, and the SE measures the optical spectra of the samples simultaneously. The thin-film thickness information obtained from RHEED facilitates the SE modeling process, which allows extracting the in situ optical spectra, i.e., the dielectric functions of thin-films during growth. The in situ dielectric functions contain indispensable information about the electronic structure of thin-films. We demonstrate the performance of this system by growing LaMnO3+δ (LMO) thin-films on SrTiO3 (001) substrates. By using in situ SE and RHEED simultaneously, we show that real-time thickness and dielectric functions of the LMO thin-films can be effectively extracted. The simultaneous monitoring of both optical SE and RHEED offers important clues to understand the growth mechanism of atomic-scale thin-films.
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April 2013
Research Article|
April 04 2013
Pulsed laser deposition with simultaneous in situ real-time monitoring of optical spectroscopic ellipsometry and reflection high-energy electron diffraction
J. H. Gruenewald;
J. H. Gruenewald
Department of Physics and Astronomy,
University of Kentucky
, Lexington, Kentucky 40506, USA
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J. Nichols;
J. Nichols
Department of Physics and Astronomy,
University of Kentucky
, Lexington, Kentucky 40506, USA
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S. S. A. Seo
S. S. A. Seo
a)
Department of Physics and Astronomy,
University of Kentucky
, Lexington, Kentucky 40506, USA
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a)
E-mail: a.seo@uky.edu
Rev. Sci. Instrum. 84, 043902 (2013)
Article history
Received:
December 07 2012
Accepted:
March 15 2013
Citation
J. H. Gruenewald, J. Nichols, S. S. A. Seo; Pulsed laser deposition with simultaneous in situ real-time monitoring of optical spectroscopic ellipsometry and reflection high-energy electron diffraction. Rev. Sci. Instrum. 1 April 2013; 84 (4): 043902. https://doi.org/10.1063/1.4798621
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