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Numerical band-to-band tunnelling model for radio-frequency silicon tunnel diode with negative-differential resistance

Numerical band-to-band tunnelling model for radio-frequency silicon tunnel diode with negative-differential resistance

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The low resistive band-to-band tunnelling (BTBT) model has been developed for radio-frequency (RF) silicon negative differential resistance (NDR) device simulation on the TCAD platform. The BTBT mechanism in a forward-biased tunnel junction is modelled based on a generation–recombination term in a continuity equation by considering a spatially varying electric field through the tunnelling distance. Using this model, DC/AC characteristics of silicon NDR devices have been successfully described on a numerical device simulation platform. The calculated speed index from the junction capacitance and peak tunnelling current of the tunnel diode shows good agreement with experiments.

References

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      • V.M. Franks , K.F. Hulme , J.R. Morgan . An allo process for making high current density silicon tunnel diode junctions. Solid-State Electron. , 343 - 344
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