Volume 65, 1969

Photodeposition from tetra ethyl lead

Abstract

The adsorption of tetra ethyl lead on the surface of the quartz crystal of an electronic microbalance and the deposition rate on the crystal as a function of light intensity and pressure during the photolysis of tetra ethyl lead (TEL) were measured. Although the deposition rate was controlled by a gas-phase reaction, a secondary surface reaction controlled the delineation of the deposit. Oxygen reduced the amount of TEL adsorbed and increased the photodeposition rate by a secondary surface process. Carbon was detected in the photodeposit from pure TEL but a photodeposit obtained in oxygen did not contain either carbon or oxygen.

Article information

Article type
Paper

Trans. Faraday Soc., 1969,65, 2421-2429

Photodeposition from tetra ethyl lead

L. J. Rigby, Trans. Faraday Soc., 1969, 65, 2421 DOI: 10.1039/TF9696502421

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Spotlight

Advertisements