Issue 97, 2014

Multi-channel ferroelectric-gate field effect transistors with excellent performance based on ZnO nanofibers

Abstract

Bottom-gate multi-channel ferroelectric-gate field effect transistors (FETs) based on ZnO nanofibers were fabricated, using Bi3.15Nd0.85Ti3O12 (BNT) thin film as the gate insulator and ZnO nanofibers as the semiconductor multi-channel. The electrical characteristics of the multi-channel ZnO nanofiber ferroelectric-gate FETs showed typical p-channel transistor properties with a low threshold voltage of −0.5 V, a high effective field effect mobility, and a large on/off current ratio of 104. These excellent performances are attributed to the multi-channel ZnO nanofiber and BNT ferroelectric-gate insulator.

Graphical abstract: Multi-channel ferroelectric-gate field effect transistors with excellent performance based on ZnO nanofibers

Article information

Article type
Paper
Submitted
25 May 2014
Accepted
15 Oct 2014
First published
20 Oct 2014

RSC Adv., 2014,4, 54924-54927

Multi-channel ferroelectric-gate field effect transistors with excellent performance based on ZnO nanofibers

H. J. Song, D. Lv, J. B. Wang, B. Li, X. L. Zhong, L. H. Jia and F. Wang, RSC Adv., 2014, 4, 54924 DOI: 10.1039/C4RA04937C

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