Issue 10, 2012
From the journal:

Journal of Materials Chemistry

Electron injection barriers between air-stable electride with low work function, C12A7:e−, and pentacene, C60 and copper phthalocyanine

Hiroshi Yanagi,a   Toshifumi Kuroda,b   Ki-Beom Kim,b   Yoshitake Toda,c   Toshio Kamiyab  and  Hideo Hosono*bc  

* Corresponding authors

a Interdisciplinary Graduate School of Medical & Engineering, University of Yamanashi, 4-4-37, Takeda, Kofu, Japan

b Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama, Japan
E-mail: hosono@msl.titech.ac.jp

c Frontier Research Center, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama, Japan

Abstract

Electron injection barriers (EEIB) at the interfaces between an air-stable electride with a work function of 3.0 eV, C12A7:e−, and organic semiconductor layers were examined by ultraviolet photoelectron spectroscopy. Low EEIB values were obtained for pentacene (0.8 eV) and C60 (0.4 eV), but not for copper phthalocyanine (1.0 eV), suggesting Fermi level pinning. The value of 0.4 eV is the lowest EEIB for conventional organic semiconductors.

Graphical abstract: Electron injection barriers between air-stable electride with low work function, C12A7:e−, and pentacene, C60 and copper phthalocyanine

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Article information

DOI
https://doi.org/10.1039/C2JM14966D
Article type
Communication
Submitted
03 Oct 2011
Accepted
19 Dec 2011
First published
06 Jan 2012

J. Mater. Chem., 2012,22, 4278-4281

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Electron injection barriers between air-stable electride with low work function, C12A7:e−, and pentacene, C60 and copper phthalocyanine

H. Yanagi, T. Kuroda, K. Kim, Y. Toda, T. Kamiya and H. Hosono, J. Mater. Chem., 2012, 22, 4278 DOI: 10.1039/C2JM14966D

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