Issue 8, 2012
From the journal:

Journal of Materials Chemistry

Nanotexturation-induced extreme wettability of an elemental tellurium coating†

Jesús M. Velázquez,a   Anil V. Gaikwad,b   Tapan K. Rout,b   Robert E. Baier,c   Edward S. Furlanide  and  Sarbajit Banerjee*a  

* Corresponding authors

a Department of Chemistry, University at Buffalo, The State University of New York, Buffalo, NY, USA
E-mail: sb244@buffalo.edu

b Research, Development and Technology, Tata Steel Group (Europe), Ijmuiden, The Netherlands

c Department of Oral Diagnostic Sciences, University at Buffalo, SUNY, Buffalo, NY, USA

d Department of Chemical and Biological Engineering, University at Buffalo, SUNY, Buffalo, NY, USA

e Department of Electrical Engineering, University at Buffalo, The State University of New York, Buffalo, NY, USA

Abstract

A combination of microscale and nanoscale texturation has been achieved in hierarchically structured Te coatings deposited onto a variety of substrata via self-catalyzed vapor transport. The coating thickness and roughness of the deposited Te surfaces are tunable via control over the reaction temperature and diffusion flux. The intricately structured surfaces exhibit sub-40 ms flash spreading of water to eventual macroscopic contact angles of 0° without any need for surface cleaning. The wettability characteristics of the surface are ascribed to the role of the hierarchical roughness in stabilizing the droplet/surface interactions in the Wenzel regime. The surfaces retain their hydrophilic properties over several months and are especially notable as a conductive addition to materials exhibiting unusual superwetting behaviour.

Graphical abstract: Nanotexturation-induced extreme wettability of an elemental tellurium coating

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Article information

DOI
https://doi.org/10.1039/C1JM14664E
Article type
Paper
Submitted
20 Sep 2011
Accepted
14 Nov 2011
First published
19 Dec 2011

J. Mater. Chem., 2012,22, 3335-3339

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Nanotexturation-induced extreme wettability of an elemental tellurium coating

J. M. Velázquez, A. V. Gaikwad, T. K. Rout, R. E. Baier, E. S. Furlani and S. Banerjee, J. Mater. Chem., 2012, 22, 3335 DOI: 10.1039/C1JM14664E

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