Issue 19, 2011
From the journal:

Chemical Communications

A high-performing nanostructured TiO2 filter for volatile organic compounds using atomic layer deposition†

Hye Jin Lee,a   Hyun Ook Seo,b   Dong Wun Kim,b   Kwang-Dae Kim,b   Yuan Luo,b   Dong Chan Lim,c   HyungKuk Ju,d   Jin Won Kim,d   Jaeyoung Leed  and  Young Dok Kim*b  

* Corresponding authors

a Department of Chemistry, Kyungpook National University, 1370 Sankyuk-dong, Buk-gu, Daegu-city, Republic of Korea

b Department of Chemistry, Sungkyunkwan University, Suwon, Korea
E-mail: ydkim91@skku.edu

c Materials Processing Division, Korea Institute of Materials Science, Changwon, Korea

d Ertl Center for Electrochemistry and Catalysis, School of Environmental Science and Engineering, GIST, Korea

Abstract

Novel nanostructured gas filtering systems with TiO2 thin films using atomic layer deposition (ALD) were developed for volatile organic compounds. A superior toluene adsorption efficiency was found for the nanostructured TiO2 thin films.

Graphical abstract: A high-performing nanostructured TiO2 filter for volatile organic compounds using atomic layer deposition

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Article information

DOI
https://doi.org/10.1039/C1CC10307E
Article type
Communication
Submitted
17 Jan 2011
Accepted
22 Mar 2011
First published
07 Apr 2011

Chem. Commun., 2011,47, 5605-5607

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A high-performing nanostructured TiO2 filter for volatile organic compounds using atomic layer deposition

H. J. Lee, H. O. Seo, D. W. Kim, K. Kim, Y. Luo, D. C. Lim, H. Ju, J. W. Kim, J. Lee and Y. D. Kim, Chem. Commun., 2011, 47, 5605 DOI: 10.1039/C1CC10307E

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