MOCVD of TiO2 thin films and studies on the nature of molecular mechanisms involved in the decomposition of [Ti(OPri)2(tbaoac)2]

R. Bhakta; R. Thomas; F. Hipler; H. F. Bettinger; J. Müller; P. Ehrhart; A. Devi

doi:10.1039/B405963H

MOCVD of TiO₂ thin films and studies on the nature of molecular mechanisms involved in the decomposition of [Ti(OPrⁱ)₂(tbaoac)₂]†

R. Bhakta,^a R. Thomas,^b F. Hipler,^c H. F. Bettinger,^d J. Müller,*^e P. Ehrhart^b and A. Devi*^a

* Corresponding authors

^a Inorganic Materials Chemistry Group, Lehrstuhl für Anorganische Chemie II, Ruhr-University Bochum, D-44780 Bochum, Germany
E-mail: anjana.devi@ruhr-uni-bochum.de

^b Institut für Festkörper Forschung (IFF), Forschungszentrum Jülich, D-52425 Jülich, Germany

^c RuboChem, P.O. Box 250 552, D-44743 Bochum, Germany

^d Lehrstuhl für Organische Chemie II, Ruhr-University Bochum, D-44780 Bochum, Germany

^e Department of Chemistry, University of Saskatchewan, 110 Science Place, Saskatoon, Canada

Abstract

A tailored precursor namely bis(isopropoxy)bis(tert-butylacetoacetato)titanium [Ti(OPrⁱ)₂(tbaoac)₂] was developed which showed good promise for depositing TiO₂ thin films at reduced substrate temperatures compared to [Ti(OPrⁱ)₂(thd)₂]. Uniform films with high growth rates (∼10 nm min⁻¹) and lower surface roughness (<2 nm) were obtained on SiO_x/Si and Pt/ZrO_x/SiO_x/Si substrates. Electrical properties of the films on Si substrates were studied and lowest equivalent oxide thickness (EOT) was around 2 nm and anatase phase had a dielectric constant around 40. A study on the thermolysis behaviour of [Ti(OPrⁱ)₂(tbaoac)₂] was carried out using matrix-isolation FTIR spectroscopy, to understand the mechanistic details of its thermal decomposition. It was found that the decomposition takes place by the formation of ketene intermediates.

This article is part of the themed collection: From Molecules to Materials: Materials Discussion 7

Article information

https://doi.org/10.1039/B405963H

Article type

Paper

Submitted

20 Apr 2004

Accepted

10 Jun 2004

First published

28 Sep 2004

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J. Mater. Chem., 2004,14, 3231-3238

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MOCVD of TiO₂ thin films and studies on the nature of molecular mechanisms involved in the decomposition of [Ti(OPrⁱ)₂(tbaoac)₂]

R. Bhakta, R. Thomas, F. Hipler, H. F. Bettinger, J. Müller, P. Ehrhart and A. Devi, J. Mater. Chem., 2004, 14, 3231 DOI: 10.1039/B405963H

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Journal of Materials Chemistry