Issue 10, 2002
From the journal:

Journal of Materials Chemistry

Intelligent window coatings: atmospheric pressure chemical vapour deposition of vanadium oxides

Troy D. Manning,a   Ivan P. Parkin,*a   Robin J. H. Clark,a   David Sheel,b   Martyn E. Pembleb  and  Dimitra Vernadoub  

* Corresponding authors

a Department of Chemistry, Christopher Ingold Laboratories, University College London, 20 Gordon street, London, UK

b Department of Chemistry, University of Salford, Cockcroft Campus, Salford, Manchester, UK

Abstract

Thin films of the vanadium oxides, V2O5, VO2, VOx (x = 2.00–2.50) and V6O13 were prepared on glass substrates by atmospheric pressure chemical vapour deposition (APCVD) of vanadium tetrachloride and water at 400–550 °C. The specific phase deposited was found to be dependent on the substrate temperature and the reagent concentrations. The films were characterised by Raman microscopy, X-ray diffraction (XRD), Rutherford backscattering (RBS), scanning electron microscopy (SEM), energy dispersive analysis by X-rays (EDX), reflectance/transmittance and UV absorption spectroscopy. The VO2 films show by Raman microscopy and reflectance/transmittance spectroscopy, reversible switching behaviour at 68 °C associated with a phase change from monoclinic (MoO2 structure) to tetragonal (TiO2, rutile structure).

Graphical abstract: Intelligent window coatings: atmospheric pressure chemical vapour deposition of vanadium oxides

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Article information

DOI
https://doi.org/10.1039/B205427M
Article type
Paper
Submitted
05 Jun 2002
Accepted
26 Jul 2002
First published
20 Aug 2002

J. Mater. Chem., 2002,12, 2936-2939

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Intelligent window coatings: atmospheric pressure chemical vapour deposition of vanadium oxides

T. D. Manning, I. P. Parkin, R. J. H. Clark, D. Sheel, M. E. Pemble and D. Vernadou, J. Mater. Chem., 2002, 12, 2936 DOI: 10.1039/B205427M

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