Kinetic studies and ab initio investigations of the reactions of atomic bromine with methylsilane and dimethylsilane
Abstract
The kinetics of the reactions of Br[4p(2PJ)] with CH3SiH3(1) and (CH3)2SiH2(2) have been measured using flash photolysis/time-resolved atomic resonance spectroscopy over the temperature ranges 350–550 and 390–550 K, respectively. The results are k1=(4.0 ± 0.5)× 10–10 exp(–19.7 ± 0.5 kJ mol–1/RT) and k2=(4.3 ± 0.8)× 10–10 exp(–21.6 ± 0.7 kJ mol–1/RT) in units of cm3 s–1, with confidence limits of ca.±13%. Assumed activation energies for the reverse reactions yield Si—H bond dissociation enthalpies, D298, of 388 ± 5 and 392 ± 5 kJ mol–1 in methylsilane and dimethylsilane, respectively. These values and the Arrhenius parameters are intermediate between earlier results for Br + SiH4 and Br +(CH3)3SiH, although the uncertainty in D298 is too great to establish a firm trend in D298 with the degree of methylation. The silanes and corresponding silyl radicals are characterized by ab initio methods at up to the MP4/6-31G*//HF/6-31G* level.