Issue 3, 1993

Kinetic studies and ab initio investigations of the reactions of atomic bromine with methylsilane and dimethylsilane

Abstract

The kinetics of the reactions of Br[4p(2PJ)] with CH3SiH3(1) and (CH3)2SiH2(2) have been measured using flash photolysis/time-resolved atomic resonance spectroscopy over the temperature ranges 350–550 and 390–550 K, respectively. The results are k1=(4.0 ± 0.5)× 10–10 exp(–19.7 ± 0.5 kJ mol–1/RT) and k2=(4.3 ± 0.8)× 10–10 exp(–21.6 ± 0.7 kJ mol–1/RT) in units of cm3 s–1, with confidence limits of ca.±13%. Assumed activation energies for the reverse reactions yield Si—H bond dissociation enthalpies, D298, of 388 ± 5 and 392 ± 5 kJ mol–1 in methylsilane and dimethylsilane, respectively. These values and the Arrhenius parameters are intermediate between earlier results for Br + SiH4 and Br +(CH3)3SiH, although the uncertainty in D298 is too great to establish a firm trend in D298 with the degree of methylation. The silanes and corresponding silyl radicals are characterized by ab initio methods at up to the MP4/6-31G*//HF/6-31G* level.

Article information

Article type
Paper

J. Chem. Soc., Faraday Trans., 1993,89, 419-423

Kinetic studies and ab initio investigations of the reactions of atomic bromine with methylsilane and dimethylsilane

L. Ding and P. Marshall, J. Chem. Soc., Faraday Trans., 1993, 89, 419 DOI: 10.1039/FT9938900419

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