Abstract
Electrodeposition of titanium was carried out in the K3TiF6–LiF–NaF–KF melt using both direct (DC) and unipolar pulse current (PC) techniques. Dense and smooth titanium coatings were obtained by PC plating at 750 °C whereas DC plating led to rough and dendritic deposits. The best results were obtained using a 100 μC cm−2 pulse charge and a cathodic current density of 50 and 75 mA cm−2. The cathodic current efficiency was in the range 60–65%. The titanium deposits obtained under such conditions behaved similarly to CP-titanium in NaCl and HNO3 solutions at room temperature.
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S. Biallozor and A. Lisowska, Electrochim. Acta 25 (1980) 1209.
A. Lisowska and S. Biallozor, Electrochim. Acta 27 (1982) 105.
V.N. Kudryatsev, B.F. Lyakhov. W.G. Anufriev and K.S. Pedan, Hydrog. Met. Proc. Int. Cong. 2nd (Pergamon, Oxford, 1977), p. 5.
A.N. Sofronkov, E.N. Pervii, V.N. Presnov and N.F. Semizorov, Zh. Prikl. Khim. 51 (1978) 607.
M. Nardin and G. Lorthioir, J. Less Common Metals 56 (1977) 269.
G.D.P. Cordner and H.W. Worner, Austr. J. Appl. Sc. 2 (1951) 358.
A. Brenner and S. Senderoff, J. Electrochem. Soc. 99 (1952) 223c.
G.M. Haarberg, W. Rolland, A. Sterten and J. Thonstad, J. Appl. Electrochem. 23 (1993) 217.
A.R. Stetson, Mat. Des. Eng. 57 (1963) 81.
K. Matiasovsky, Z. Lubyova and V. Danek, Electrodep. Surf. Treat. 1 (1972/73) 43.
Texas Instruments Inc., Fr. Demande 2 075 857 (1971).
G.A. Kline, Eur. Pat. Appl. 79055 (1983).
J. de Lepinay, J. Bouteillon, S. Traore, D. Renaud and M.J. Barbier, J. Appl. Electrochem. 17 (1987) 294.
A. Robin, J. de Lepinay and M.J. Barbier, J. Electroanal. Chem. 230 (1987) 125.
M.E. Sibert and M.A. Steinberg, J. Electrochem. Soc. 102 (1955) 641.
L.P. Polyakova, P.T. Stangrit and E.G. Polyakov, Electrochim. Acta 31 (1986) 159.
D. Wei, M. Okido and T. Oki, J. Appl. Electrochem. 24 (1994) 923.
N. Ene and S. Zuca, J. Appl. Electrochem. 25 (1995) 671.
G.N. Novitskaya, L.I. Zarubitskaya and V.I. Shapoval, Khim. Tekhnol. (Kiev) 5 (1981) 57.
A. Robin, Doctoral thesis, Grenoble, France (1987).
J.C. Puippe and F. Leeman (Ed.), ‘Theory and Practice of Pulse Plating’, American Electroplating and Surface Finishing Society, Orlando (1986).
S.H. White and U.M. Twardoch, J. Appl. Electrochem. 17 (1987) 225.
R.A. Bailey and T. Yoko, J. Appl. Electrochem. 16 (1986) 737.
A. Katagiri, M. Suzuki and Z. Takehara, J. Electrochem. Soc. 138 (1991) 767.
U. Cohen, J. Electrochem. Soc. 128 (1981) 731.
A. Roos, ‘Technique Métallographique’ (Dunod, Paris, 1960), p. 77.
A. Robin, J. de Lepinay and M.J. Barbier, J. Appl. Electrochem. 20 (1990) 289.
T.B. Massalski (Ed.), ‘Binary Alloy Phase Diagrams', Vol. 2, ASM (1986), p. 1118.
'selected Powder Diffraction Data for Metals and Alloys', Data Book, 1st edn., Vol. 1 (JCPDS Publ., Swarthmore (Pennsylvania, USA) 1978), p. 112.
L.C. Covington and R.W. Shutz, ‘Industrial Applications of Titanium and Zirconium’, ASTM STP 728 (ASTM, 1981), p. 163.
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Robin, A., Ribeiro, R. Pulse electrodeposition of titanium on carbon steel in the LiF–NaF–KF eutectic melt. Journal of Applied Electrochemistry 30, 239–246 (2000). https://doi.org/10.1023/A:1003994100902
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DOI: https://doi.org/10.1023/A:1003994100902