Thermal chemical vapor deposition grown graphene heat spreader for thermal management of hot spots
Introduction
Thermal management of hot spots with localized high heat flux is critical for high power electronic devices. Non-uniform heat dissipation leads to the overheating of specific areas in chips, affecting the computing performance and reliability of electronic devices. Active solutions like thermoelectrics [1], [2], enable site-specific and on demand cooling in electronic devices. For passive solutions, a heat spreader without power consumption is widely used. Metallic materials such as Cu and Al, are utilized to dissipate heat from the hot spots owing to their high thermal conductivity (200–400 W m−1 K−1). While, due to the scattering of electrons from the film surfaces, the thermal conductivity of metal film decreases with the decrease of film thickness [3]. For instance, the thermal conductivity of 140 nm thick Al thin films was measured to be 94 W m−1 K−1[4] compared with the bulk value of ∼237 W m−1 K−1. At a thickness of ∼140 nm, the thermal conductivity of Cu thin films decreases to ∼220 W m−1 K−1[5], which is ∼55% of the bulk value. Graphene, a one atomic layer sheet of carbon atoms, is proposed as a promising heat spreader material, as its strong sp2 bonds result in ultrahigh thermal conductivity of 5300 W m−1 K−1[6], [7]. Recently, Yan et al. [8] reported the application of exfoliated graphene quilts (few-layer graphene) in the thermal management of a high-power transistor. The temperature of the hot spot was reduced by ∼20 °C, extending the transistor’s lifetime by one order of magnitude. However, there are several issues to be addressed before graphene can be commercialized for this application. It is well known that the mechanical exfoliation of highly oriented pyrolytic graphite (HOPG) provides the best quality graphene structure, but the layer numbers of graphene, exfoliated size and location are difficult to control. Complementary metal oxide semiconductor (CMOS) fabrication techniques require uniform graphene deposition for wafer scale processing [9], [10]. Thermal chemical vapor deposition (TCVD) is thus a feasible way to fabricate large area graphene [9], [10], [11], [12], [13], [14], allowing mass production of the graphene heat spreaders. Due to the nanostructures and the acoustic phonon transport properties, different layer numbers are required to maximize its thermal performance [6], [15], [16], [17], [18], and TCVD allows layer number control of the fabricated graphene [14], [19], [20], [21], [22]. Moreover, recent breakthroughs in graphene synthesis show that uniform, large-size and single-crystalline hexagonal graphene can be obtained from a controlled Cu surface [23], [24] and optimized synthesis parameters [25], making the quality of the CVD graphene comparable to the exfoliated ones.
In this paper, the application of TCVD prepared monolayer and multilayer graphene heat spreaders is demonstrated. The graphene was transferred onto a thermal evaluation chip, using a calibrated platinum (Pt) circuit driven by electric current as a hot spot, in which the temperature can be evaluated by measuring the electric resistance of the Pt circuit. Thermal performance of the graphene heat spreaders was evaluated by the temperature drop of the hot spots after the graphene transfer.
Section snippets
Graphene synthesis
A TCVD (Black Magic, AIXTRON Nanoinstruments Ltd.), as schematically shown in Fig. 1a, was used for monolayer graphene synthesis. 1 μm thick Cu thin films were prepared by electron beam (e-beam) evaporation (HVC600, AVAC) on the SiO2 substrates. They were then cleaned with acetone, isopropyl alcohol and distilled water, and were placed on the heating stage with a thermocouple attached on the stage surface. C2H2 and argon (Ar) were chosen respectively as the carbon precursor and the gas carrier.
Graphene synthesis
Synthesis parameters were optimized in order to fabricate monolayer graphene. As shown in Fig. 2b, the monolayer graphene structure is clearly identified at the edge of the folded graphene in Fig. 2a. Due to the unique electron bands of graphene, Raman spectroscopy can distinguish a monolayer graphene from multilayer ones. For the as synthesized graphene on Cu thin film, the G band (∼1582 cm−1) and the 2D band (∼2693 cm−1) are identified (Fig. 2d), with an IG/I2D intensity ratio of ∼0.25, and the
Summary
Graphene was demonstrated to be a promising heat spreader material for heat dissipation of hot spots with high heat flux. The Pt micro-heater embedded chip was a reliable platform for graphene thermal performance evaluation. By introducing the monolayer graphene heat spreader, the hot spot temperature was decreased by about 13 °C at a heat flux of up to 430 W cm−2, and the multilayer ones (n = 6–10) cooled the hot spots by ∼8 °C. This illustrates the potential of TCVD grown graphene as a promising
Acknowledgements
This work is supported by EU programs “Nano-TIM”, Nanotherm”, “Smartpower”, and SSF program “Scalable Nanomaterials and Solution Processable Thermoelectric Generators” with the contract no EM11-0002, the Chinese Ministry for Science and Technology within the international collaboration program within the contract (No. 2010DFA14450), Shanghai Science and Technology Program (12JC1403900) and NSFC (51272153). This work was also carried out within the Sustainable Production Initiative and the
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