Elsevier

Solid-State Electronics

Volume 44, Issue 7, 1 July 2000, Pages 1331-1333
Solid-State Electronics

Technical Note
Analytical modeling of pnp InP/InGaAs heterojunction bipolar transistors

https://doi.org/10.1016/S0038-1101(00)00055-1Get rights and content

Abstract

Pnp InP/InGaAs heterojunction bipolar transistors have been modeled using a modified Gummel–Poon model, and the results are compared with experimental measurements and results from a commercial simulator. The model provides a good description of the transistor’s high frequency performance and describes the falloff in device performance at high current densities. The model overestimates the current gain at low current densities by neglecting hole recombination in the base side of the emitter–base space charge region.

Introduction

Recently, Pnp heterojunction bipolar transistors (HBTs) have been demonstrated in InP-based materials operating at microwave frequencies [1], [2], [3], [4], [5], [6]. Lunardi et al. [1] have reported InP/InGaAs Pnp HBTs with a current gain as high as 420, a cutoff frequency fT of 10.5 GHz and a maximum frequency of oscillation fmax of 25 GHz. Stanchina et al. [2], [3] have reported comparable results for InAlAs/InGaAs Pnp HBTs. The devices are of interest for integration with Npn HBTs in complementary HBT (CHBT) based circuits [2], [3], [4], [5], [6], [7], [8] and for power applications [9]. Previously, we reported the development of a modified Gummel–Poon model for Pnp HBTs and compared the model’s results with experimental measurements for InAlAs/InGaAs HBTs [10]. In this work, we compare the results of the analytical model for InP/InGaAs Pnp HBTs with the experimental reports [1], and the results from a commercial numerical simulator for Ref. [11]. In Section 2, we briefly summarize the device physics included in the analytical model. A comparison of the experimental and simulation results is presented in Section 3. In Section 4, we draw conclusions regarding the limitations of the analytical model and means for improving it, and factors limiting the device’s performance.

Section snippets

Device modeling

To study the performance of the InP/InGaAs Pnp HBT, the analytical model recently reported [10] was employed. The model’s development follows that previously reported for the Npn HBT [12], [13] by matching the carrier thermionic-field-emission current across the emitter–base heterojunction with the drift-diffusion current in the base to derive the excess carrier concentration at the emitter end of the quasi-neutral base. The drift-diffusion of holes across the emitter space charge region is

Results

The epitaxial layer structure for the InP/InGaAs Pnp HBT modeled is similar to that previously reported by Lunardi et al. [1]. To provide grading of the valence band discontinuity, the device structure incorporates an InGaAsP quaternary layer between the emitter and the base. Fig. 1 shows the current gain as a function of the collector current density calculated using the analytical model, and compared with the experimental and numerical modeling results. Near the current density corresponding

Conclusion

In summary, we have compared results from an analytical model for Pnp InP/InGaAs HBTs with the experimental results and results from a commercial numerical device simulator. Reasonable agreement has been found for the device’s high frequency performance. The results suggest that the analytical model provides a useful tool for device design and development that complements the capabilities provided by commercial device simulators. In particular, the model has been used to examine the effects of

Acknowledgements

This work was supported by the National Science Foundation under Grant no. ECS-9525942.

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