Elsevier

Surface Science

Volume 162, Issues 1–3, 3 October 1985, Pages 25-28
Surface Science

Chlorine adsorption on Si(111) × 7 and GaAs(110)1 × 1: New photoemission results☆

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Abstract

Chlorine adsorption on Si(111)7 × 7 and GaAs(110)1 × 1 has been studied with various photoemission techniques using synchrotron radiation: surface-sensitive core-level photoelectron spectroscopy, polarisation-dependent angle-resolved photoelectron spectroscopy and photoemission angular distribution pictures. These techniques give information about local bonding geometries and the surface band structure of the chemisorbed chlorine atoms.

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Cited by (0)

☆

Work supported by the Bundesministerium für Forschung und Technologie from Funds for synchrotron radiation research.

∗∗

Permanent address: IBM Thomas J. Watson Research Center. Yorktown lteights, New York 10598, USA.

∗∗

Permanent address: lnstitut fur Physikalische Chemie der Universitat MiJnchen. Sophienstrasse 11, D-8000 Mianchen 2, Fed. Rep. of Germany.

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