Letter to the editor
Erosion of amorphous hydrogenated boron-carbon thin films

https://doi.org/10.1016/0022-3115(96)00389-3Get rights and content

Abstract

Amorphous hydrogenated boron-carbon (a-B1 − xCx:H) thin films were prepared by radio-frequency plasma-enhanced chemical vapor deposition (RF-PECVD) using CH4 and (B2H6 + H2) as precursor gases. Composition and density was analyzed with ion beam analysis. The films were eroded by hydrogen and helium electron cyclotron resonance (ECR) plasmas. The ion energy during erosion was varied by applying an additional rf bias to the target electrode. Erosion rates were measured by in situ ellipsometry. a-B1 − xCx:H films with a carbon content of 15% were shown to be most resistent against erosion with hydrogen plasmas. In contrast, pure a-B:H films exhibit the lowest erosion yield in helium plasmas.

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