Abstract
We used x-ray diffraction and transmission electron microscopy to study the mechanism of thermal misfit strain relaxation in epitaxial Ge films grown on Si(001) substrates by the two-step growth technique. Lattice misfit strain associated with Ge/Si(001)Si mismatched epitaxy is largely relieved by a network of Lomer edge misfit dislocations during the first step of growth. However, thermal misfit strain during growth is relieved primarily by interdiffusion at the Si/Ge heterointerface. Two SiGe compositions containing 0.5 at.% and 6.0 at.% Si detected at the interface relieve thermal mismatch strain associated with the two growth steps. A thermodynamic model has been proposed to explain the state of strain in the films.
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Acknowledgements
We would like to thank Oak Ridge National Laboratory, Tennessee, for their assistance in acquiring the Z-contrast STEM images. The authors would like to thank Dr. Bruce Cook and Jonathan Pierce from RTI International for their feedback. We thank Dr. Rama Venkatasubramanian for his views on this research. This work was supported by RTI International.
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Bharathan, J., Zhou, H., Narayan, J. et al. Thermal Misfit Strain Relaxation in Ge/(001)Si Heterostructures. J. Electron. Mater. 43, 3196–3203 (2014). https://doi.org/10.1007/s11664-014-3247-6
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DOI: https://doi.org/10.1007/s11664-014-3247-6