Abstract
We investigated the properties of indium-doped zinc oxide layers grown by metalorganic chemical vapor deposition on semi-insulating GaN(0001) templates. Specular and transparent films were grown with n-type carrier concentrations up to 1.82 × 1019 cm−3 as determined by Hall measurements, and all In-doped films had carrier concentrations significantly higher than that of a comparable undoped film. For low In flows, the carrier concentration increased accordingly with trimethyl-indium (TMIn) flow until a maximum carrier concentration of 1.82 × 1019 cm−3 was realized. For higher In flows, the carrier concentration decreased with increasing TMIn flow rate. Sheet resistance as low as 185 Ω/sq was achieved for the In-doped films, which is a significant decrease from that of a comparable undoped ZnO film. Our n-type doping studies show that In is an effective dopant for controlling the n-type conductivity of ZnO.
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Acknowledgements
This work was supported by MRSEC Program of the National Science Foundation under Award No. DMR05-20415 and by SSLEC.
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Open Access This is an open access article distributed under the terms of the Creative Commons Attribution Noncommercial License (https://creativecommons.org/licenses/by-nc/2.0), which permits any noncommercial use, distribution, and reproduction in any medium, provided the original author(s) and source are credited.
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Ben-Yaacov, T., Ive, T., Van de Walle, C.G. et al. Properties of In-Doped ZnO Films Grown by Metalorganic Chemical Vapor Deposition on GaN(0001) Templates. J. Electron. Mater. 39, 608–611 (2010). https://doi.org/10.1007/s11664-009-1022-x
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DOI: https://doi.org/10.1007/s11664-009-1022-x