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Fabrication of Hydrophobic Zeolites Using Triethoxyfluorosilane and their Application for Photocatalytic Degradation of Acetaldehyde

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Abstract

Hydrophobically modified zeolites were prepared using alkoxide reagent containing fluorine, triethoxyfluorosilane (TEFS). These zeolites have still maintained mesoporous structure and large surface area and showed more hydrophobic property compared with unmodified zeolite. Moreover surface modified zeolite prepared thus was applied as a support of TiO2 photocatalyst for efficient adsorption and photocatalytic degradation of acetaldehyde diluted in air. With an increase in the grafted amount of TEFS reagent, the TiO2 photocatalyst deposited on the modified zeolite showed greater photocatalytic activities for the degradation of acetaldehyde compared with that on unmodified zeolite due to its hydrophobic property.

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Acknowledgment

The present work is supported by the Grant-in-Aid for Scientific Research (KAKENHI) from Ministry of Education, Culture, Sports, Science and Technology of Japan (No. 20360363). The X-ray adsorption experiments were performed at the BL-9A facility of the Photon Factory at the National Laboratory for High-Energy Physics, Tsukuba, Japan.

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Authors and Affiliations

  1. Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka, 565-0871, Japan

    Yasutaka Kuwahara, Takashi Kamegawa, Kohsuke Mori & Hiromi Yamashita

  2. National Institute of Advanced Industrial Science and Technology (AIST), Kansai Center, 1-8-31 Midorigaoka, Ikeda, Osaka, 563-8577, Japan

    Yasuyuki Matsumura

Authors
  1. Yasutaka Kuwahara
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  2. Takashi Kamegawa
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  3. Kohsuke Mori
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  4. Yasuyuki Matsumura
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  5. Hiromi Yamashita
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Corresponding author

Correspondence to Hiromi Yamashita.

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Kuwahara, Y., Kamegawa, T., Mori, K. et al. Fabrication of Hydrophobic Zeolites Using Triethoxyfluorosilane and their Application for Photocatalytic Degradation of Acetaldehyde. Top Catal 52, 643–648 (2009). https://doi.org/10.1007/s11244-009-9219-z

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  • DOI: https://doi.org/10.1007/s11244-009-9219-z

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