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Characterization of Boron-Doped ZnO Nanorods Fabricated Using Diborane Plasma

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Abstract

ZnO nanowire or nanorod arrays have caused great interest owing to their unique properties and versatile applications in short-wavelength lasers, electroluminescent devices, photocatalytic systems, and solar cells, etc. The electrical and optical properties of ZnO nanorod arrays can be altered and controlled through doping. In this paper, B2H6 plasma treatment was employed to improve the electrical properties of ZnO nanorod arrays prepared by hydrothermal synthesis. A clear decrease in the resistivity of ZnO nanorod arrays with B2H6 plasma treatment was observed. Moreover, the measurement results of XPS and Hall measurement show that the B2H6 plasma treatment can be used to achieve n-type doping via B atoms substitution for Zn atoms.

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Acknowledgments

This work was supported by the National Natural Science Foundation of china (Grant No. 51272033), The Privileged Development Program of Jiangsu High Education on Renewable Energy and Materials, the Natural Science Foundation of the Jiangsu Higher Education Institutions of China (Grant Nos. 14KJA430001, EEKJA48000).

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Authors and Affiliations

  1. Research Center of Micro/Nano Science and Technology, Jiangsu University, Zhenjiang, 212023, Jiangsu, China

    Xiuqin Wang, Jianhua Qiu & Jianning Ding

  2. Jiangsu Collaborative Innovation Center of Photovoltaic Science and Engineering, Changzhou University, Changzhou, 213164, Jiangsu, China

    Xiuqin Wang, Jianhua Qiu, Ying Wang, Ningyi Yuan & Jianning Ding

  3. Jiangsu Province Cultivation Base for State Key Laboratory of Photovoltaic Science and Technology, Changzhou University, Changzhou, 213164, Jiangsu, China

    Xiuqin Wang, Jianhua Qiu, Ying Wang, Ningyi Yuan & Jianning Ding

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  1. Xiuqin Wang
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  2. Jianhua Qiu
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  3. Ying Wang
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  4. Ningyi Yuan
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  5. Jianning Ding
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Correspondence to Ningyi Yuan or Jianning Ding.

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Wang, X., Qiu, J., Wang, Y. et al. Characterization of Boron-Doped ZnO Nanorods Fabricated Using Diborane Plasma. Plasma Chem Plasma Process 35, 913–923 (2015). https://doi.org/10.1007/s11090-015-9631-z

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  • DOI: https://doi.org/10.1007/s11090-015-9631-z

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