Abstract
Plasmas in saline solution driven by a repetitive bipolar pulsed power source are studied. We use a negative pulse to generate electrolytic gas with a controllable amount, followed by a positive pulse to ignite the plasma. With an increase in the negative voltage pulse amplitude from 0 to −80 V, we observed an increase in the amount of electrolytic gas (hydrogen) formation, resulting in a reduced time delay, from 65 to 6 μs, required to ignite the plasma upon the onset of the positive pulse. A decrease, from 1.75 to 1.0 A, in the peak currents within the positive voltage pulse is also observed. Optical emission spectroscopy shows that the intensity ratio of the Hα (656 nm) to Na (588 nm) emission lines increases from zero to 0.0035. These observations can be well explained by the increase in the gas coverage on the electrode surface and the change in the gas composition within which the plasma is ignited with the application of the negative pulse.
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Kanazawa S, Kawano H, Watanabe S, Furuki T, Akamine S, Ichiki R, Ohkubo T, Kocik M, Mizeraczyk J (2011) Plasma Sources Sci Technol 20:034010
Locke BR, Sato M, Sunka P, Hoffmann MR, Chang JS (2006) Ind Eng Chem Res 45:882–905
Foster JE, Weatherford B, Gillman E, Yee B (2010) Plasma Sources Sci Technol 19:025001
Locke BR, Shih KY (2011) Plasma Sources Sci Technol 20:034006
Chen Q, Kaneko T, Hatakeyama R (2012) Appl Phys Express 5:086201
Hagino T, Kondo H, Ishikawa K, Kano H, Sekine M, Hori M (2012) Appl Phys Express 5:035101
Stalder KR, Woloszko J (2007) Contrib Plasma Phys 47:64–71
Vankov A, Palanker D (2007) J Appl Phys 101:124701
Sakiyama Y, Tomai T, Miyano M, Graves DB (2009) Appl Phys Lett 94:161501
Stalder KR, McMillen DF, Woloszko J (2005) J Phys D Appl Phys 38:1728–1738
Yerokhin AL, Nie X, Leyland A, Matthews A, Dowey SJ (1999) Surf Coat Technol 122:73–93
Bruggeman P, Leys C (2009) J Phys D Appl Phys 42:053001
Yan ZC, Chen L, Wang HL (2008) J Phys D Appl Phys 41:155205
Bruggeman P, Verreycken T, Gonzalez MA, Walsh JL, Kong MG, Leys C, Schram DC (2010) J Phys D Appl Phys 43:124005
Nikiforov AY, Leys C, Li L, Nemcova L, Krcma F (2011) Plasma Sources Sci Technol 20:034008
Takeuchi N, Ishii Y, Yasuoka K (2012) Plasma Sources Sci Technol 21:015006
Sahni M, Locke BR (2006) Ind Eng Chem Res 45:5819–5825
Bruggeman P, Schram D, Gonzalez MA, Rego R, Kong MG, Leys C (2009) Plasma Sources Sci Technol 18:025017
Hickling A, Ingram MD (1964) Trans Faraday Soc 60:783–793
Schaper L, Stalder KR, Graham WG (2011) Plasma Sources Sci Technol 20:034004
Schaper L, Graham WG, Stalder KR (2011) Plasma Sources Sci Technol 20:034003
Hsieh AH, Chang HW, Hsu CC (2012) J Phys D Appl Phys 45:415202
Chang HW, Hsu CC (2011) Plasma Sources Sci Technol 20:045001
Chang HW, Hsu CC (2012) J Phys D Appl Phys 45:255203
Shirai N, Ichinose K, Uchida S, Tochikubo F (2011) Plasma Sources Sci Technol 20:034013
Bruggeman P, Degroote J, Vierendeels J, Leys C (2008) Plasma Sources Sci Technol 17:025008
Bruggeman P, Degroote J, Leys C, Vierendeels J (2008) J Phys D Appl Phys 41:194007
Sie CY, Chang HW, Hsu CC (2011) J Electrochem Soc 158:E37–E40
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This work is supported by National Science Council, Taiwan (100-2628-E-002-012).
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Chang, Hw., Hsu, Cc. Plasmas in Saline Solution Sustained Using Bipolar Pulsed Power Source: Tailoring the Discharge Behavior Using the Negative Pulses. Plasma Chem Plasma Process 33, 581–591 (2013). https://doi.org/10.1007/s11090-013-9447-7
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DOI: https://doi.org/10.1007/s11090-013-9447-7