Abstract
P-beam writing (proton beam writing), a direct write 3D nano lithographic technique has been employed for the production of X-ray masks in a single step fabrication process, with high aspect ratios and extremely smooth absorber edges. P-beam writing employs a focused MeV proton beam scanned in a predetermined pattern over a resist (e.g. PMMA or SU-8), which is subsequently chemically developed. P-beam writing in combination with electroplating appears ideally suited to directly write X-ray masks with nano sized features, high aspect ratios, small lateral feature sizes, and smooth and vertical sidewalls. Sub 100 nm resist structures with aspect ratios up 160 have been produced, as well as metallic (nickel) structures down to the 100 nm level. Preliminary tests on p-beam written X-ray test masks show that Ni stencils can be fabricated with a thickness of 2–20 μm, smooth side walls, feature details down to 1 μm, and aspect ratios up to 20.
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References
Achenbach S (2004) Deep sub micron high aspect ratio polymer structures produced by hard X-ray lithography. Microsyst Technol 10:439–497
Ansari K, van Kan JA, Bettiol AA, Watt F (2004) Fabrication of high aspect ratio 100 nm metallic stamps for nanoimprint lithography using proton beam writing. Appl Phys Lett 85:476–478
Biersack J, Haggmark LG (1980) A Monte Carlo computer program for the transport of energetic ions in amorphous targets. Nucl Instr Meth 174:257
van Kan JA, Bettiol AA, Watt F (2003a) Three-dimensional nanolithography using proton beam writing. Appl Phys Lett 83:1629–1631
van Kan JA, Bettiol AA, Watt F (2003b) Proton beam nano-machining: end station design and testing. Mat Res Soc Symp Proc, vol. 777 T2.1.1
van Kan JA, Bettiol AA, Ansari K, Shao PG, Watt F (2004a) Improvement in proton beam writing at the nano scale. In: Proceedings of the IEEE MEMS, pp 673–676
van Kan JA, Bettiol AA, Ansari K, Teo EJ, Sum TC, Watt F (2004b) Proton beam writing: a progress review. Int J Nanotechnol 1(4):464–479
van Kan JA, Shao PG, Molter P, Saumer M, Bettiol AA, Watt F (2005) Fabrication of a free standing resolution standard for focusing MeV ion beams to sub 30 nm dimensions. Nucl Instr Meth B231:170–175
Menz W, Mohr J, Paul O (2001) Microsystem technology. Wiley-VCH, New York
Springham SV, Osipowicz T, Sanchez JL, Gan LH, Watt F (1997) Micromachining using deep ion beam lithography. Nucl Instr Meth B130:155–159
Waligorski MPR, Hamm RN, Katz R (1986) The radial distribution of dose around the path of a heavy ion in liquid water. Nucl Tracks Radiat Meas 11:309–319
Watt F, van Kan JA, Rajta I, Bettiol AA, Choo TF, Breese MBH, Osipowicz T (2003) The National University of Singapore high energy ion nano probe facility performance tests. Nucl Instr Meth B210:14–20
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The authors wish to acknowledge financial support from ASTAR Singapore, the MOE Academic Research Fund as well as the AOARD (Asian Office of Aerospace Research & Development)
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van Kan, J.A., Shao, P.G., Ansari, K. et al. Proton beam writing: a tool for high-aspect ratio mask production. Microsyst Technol 13, 431–434 (2007). https://doi.org/10.1007/s00542-006-0192-1
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DOI: https://doi.org/10.1007/s00542-006-0192-1