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Pulsed laser deposition of atomically flat La1-xSrxMnO3 thin films using a novel target geometry

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Abstract

A new ablation target geometry is presented that was used to produce thin films of La1-xSrxMnO3 grown heteroepitaxially on SrTiO3 by pulsed reactive crossed-beam laser ablation. The films were grown in order to perform angle-resolved photoelectron spectroscopy, which demands that the surface be atomically flat. In situ and ex situ analysis shows that this condition was met, even after depositing to a thickness of over 100 nm.

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Authors and Affiliations

  1. Swiss Light Source, Paul Scherrer Institute, 5232, Villigen, Switzerland

    P.R. Willmott, R. Herger, M.C. Falub, L. Patthey & M. Shi

  2. Physical Chemistry Institute, University of Zürich, Winterthurerstrasse 190, 8057, Zürich, Switzerland

    P.R. Willmott & R. Herger

  3. ETH Hönggerberg, Paul Scherrer Institute, 8093, Zürich, Switzerland

    M. Döbeli

  4. Laboratory for Micro- and Nanotechnology, Paul Scherrer Institute, 5232, Villigen, Switzerland

    C.V. Falub

  5. Laboratory for Neutron Scattering, Paul Scherrer Institute, 5232, Villigen, Switzerland

    M. Schneider

Authors
  1. P.R. Willmott
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  2. R. Herger
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  3. M.C. Falub
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  4. L. Patthey
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  5. M. Döbeli
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  6. C.V. Falub
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  7. M. Shi
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  8. M. Schneider
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Correspondence to P.R. Willmott.

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PACS

61.10.-i; 61.18.Bn; 68.47.Gh; 71.27.+a; 81.15.Fg

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Willmott, P., Herger, R., Falub, M. et al. Pulsed laser deposition of atomically flat La1-xSrxMnO3 thin films using a novel target geometry. Appl. Phys. A 79, 1199–1201 (2004). https://doi.org/10.1007/s00339-004-2717-8

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  • DOI: https://doi.org/10.1007/s00339-004-2717-8

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