Skip to main content
SpringerLink
Log in

Influence of storage time on laser cleaning of SiO2 on Si

  • Rapid communication
  • Published:
Applied Physics A Aims and scope Submit manuscript

Abstract.

The influence of the ‘storage time’ τs on the threshold fluence φcl and the efficiency in dry laser cleaning is investigated. τs denotes the time between the deposition of particles and the cleaning. As a model system we employed silica spheres with diameters of 500 nm and 1500 nm on commercial silicon wafers and single-pulse KrF excimer laser radiation (τFWHM=28 ns). For the 1500-nm silica spheres, φcl was found to increase from about 65 mJ/cm2 to 125 mJ/cm2 for storage times of 4 h and 362 h, respectively. For 500-nm silica spheres the increase in the threshold fluence was less than 20% for storage times up to 386 h.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Author information

Authors and Affiliations

  1. Applied Physics, Johannes-Kepler University, 4040 Linz, Austria, , , , , , AT

    G. Schrems, M.P. Delamare, N. Arnold & D. Bäuerle

  2. University of Konstanz, Department of Physics, 78457 Konstanz, Germany, , , , , , DE

    P. Leiderer

Authors
  1. G. Schrems
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. M.P. Delamare
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. N. Arnold
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. P. Leiderer
    View author publications

    You can also search for this author in PubMed Google Scholar

  5. D. Bäuerle
    View author publications

    You can also search for this author in PubMed Google Scholar

Additional information

Received: 12 July 2002 / Accepted: 12 July 2002 / Published online: 29 January 2003

RID="*"

ID="*"Corresponding author. E-mail:dieter.baeurle@jku.at

Rights and permissions

Reprints and permissions

About this article

Cite this article

Schrems, G., Delamare, M., Arnold, N. et al. Influence of storage time on laser cleaning of SiO2 on Si . Appl Phys A 76, 847–849 (2003). https://doi.org/10.1007/s00339-002-1761-5

Download citation

  • Issue Date:

  • DOI: https://doi.org/10.1007/s00339-002-1761-5

Search

Navigation