Abstract
A three-step process for immobilization of glutamate dehydrogenase (GDH) on the surface of silicon dioxide has been studied by X-ray photoelectron spectroscopy (XPS). The enzyme layer was deposited on the silicon dioxide surface after first exposing the surface to 3-aminopropyltriethoxysilane (3-APTS) and reacting the silylated surface with glutaraldehyde (GA). Fine XPS analysis, performed after each step of the chemical procedure, revealed unknown details of the step-by-step construction of the enzyme layer under different experimental conditions.
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Acknowledgements
The authors acknowledge MIUR for financial support and CIS (University of Bari, Bari, Italy) for XPS measurements. The authors thank also University of Lecce (Lecce, Italy) and Consorzio INCA (Venice, Italy) for their support.
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Longo, L., Vasapollo, G., Guascito, M.R. et al. New insights from X-ray photoelectron spectroscopy into the chemistry of covalent enzyme immobilization, with glutamate dehydrogenase (GDH) on silicon dioxide as an example. Anal Bioanal Chem 385, 146–152 (2006). https://doi.org/10.1007/s00216-006-0398-1
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DOI: https://doi.org/10.1007/s00216-006-0398-1