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Fluorine-contained films with high water-repellency and transparency prepared by RF plasma-enhanced CVD

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Department of Materials Processing Engineering, School of Engineering, Nagoya University, 464-01, Chikusa-ku, Nagoya, Japan

    A. Hozumi, N. Kakinoki, Y. Asai & O. Takai

Authors
  1. A. Hozumi
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  2. N. Kakinoki
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  3. Y. Asai
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  4. O. Takai
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Hozumi, A., Kakinoki, N., Asai, Y. et al. Fluorine-contained films with high water-repellency and transparency prepared by RF plasma-enhanced CVD. J Mater Sci Lett 15, 675–677 (1996). https://doi.org/10.1007/BF00264110

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  • DOI: https://doi.org/10.1007/BF00264110

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