Skip to main content
SpringerLink
Log in

Effects of pressure on metal atom transport and plasma properties during arc ion plating of TiAlN

  • Published:
Metals and Materials International Aims and scope Submit manuscript

Abstract

Arc ion plating is used to deposit titanium and aluminum nitrides as wear and corrosion resistant layers on the surface of steel tools. In this study, the deposition efficiency for the evaporated metal atoms in arc ion plating was obtained by a view factor solution for the collisionless transport and a diffusion solution for the continuum transport. In the diffusion solution, the deposition efficiency decreases rapidly with pressure. A global nitrogen plasma model with a set of simplified plasma chemistry was used to investigate the plasma properties at pressures ranging from several mTorr up to 50 mTorr. The results indicate that the electron temperature, the ratio of electric field to gas density, and the nitrogen atom density all decrease with increasing pressure, while the plasma density increases. Based on the combined considerations of deposition efficiency and effective ion bombardment of the films on the substrate, an operating pressure range from 20 to 30 mTorr is recommended for highly efficient (Ti, Al)N coating during film deposition.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. S. Y. Yoon, J. K. Kim, and K. H. Ho,Surf. Coat. Technol. 161, 237 (2002).

    Article  CAS  Google Scholar 

  2. D. Y. Wang, Y. W. Li, C. L. Chang, and W. Y. Ho,Surf. Coat. Technol. 114, 109 (1999).

    Article  CAS  Google Scholar 

  3. D. M. Mattox,Surf. Coat. Technol. 133–134, 517 (2000).

    Article  Google Scholar 

  4. D. B. Lee, M. H. Kim, and S. C. Kwon,Met. Mater.-Int. 7, 375 (2001).

    Article  CAS  Google Scholar 

  5. W. D. Munz,J. Vac. Sci. Technol. A 4 2717 (1986).

    Article  ADS  Google Scholar 

  6. K. H. Habig and G. Meier zu Kocker,Surf. Coat. Technol. 62, 428 (1993).

    Article  CAS  Google Scholar 

  7. T. Layendecker, O. Lemmar, S. Esser, and J. Ebberink,Surf. Coat. Technol. 48, 175 (1991).

    Article  Google Scholar 

  8. H. Y. Lee and J. G. Han,Mat. Let. 59, 2021 (2005).

    Article  ADS  CAS  Google Scholar 

  9. D. B. Lee,Met. Mater.-Int. 11, 313 (2005).

    Article  ADS  CAS  Google Scholar 

  10. M. Ohring,The Materials Science of Thin Films, p. 106–109, Academic Press, Boston (2002).

    Google Scholar 

  11. M. Q. Brewster,Thermal Radiative Transfer & Properties, p. 23, John Wiley & Sons, New York (1992).

    Google Scholar 

  12. T. W. Megli, H. Krier, and R. L. Burton,J. Thermophys. Heat Transfer 10, 554 (1996).

    Article  CAS  Google Scholar 

  13. M. Moravej, X. Yang, M. Barankin, J. Penelon, S. E. Babayan, and R. F. Hicks,Plasma Sources Sci. Technol. 15, 204 (2006).

    Article  ADS  CAS  Google Scholar 

  14. C. Park,J. Thermophys. Heat Transfer 7, 385 (1993).

    Article  ADS  CAS  Google Scholar 

  15. M. Saporoschenko,Phys. Rev. 139, 352 (1965).

    Article  ADS  CAS  Google Scholar 

  16. A. V. Phelps,J. Res. Natl. Inst. Stand Technol. 95, 407 (1990).

    CAS  Google Scholar 

  17. M. Mitchner and C. H. Kruger,Partially Ionized Gases, p. 107–115, Wiley, New York (1992).

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. School of Materials Science and Engineering, Anhui University of Technology, 243002, Maanshan City, Anhui Province, P. R. China

    Junqing Lu

  2. School of Nano & Advanced Materials Engineering, Changwon National University, 9, Sarim-dong, Changwon-si, 641-773, Gyeongnam, Korea

    Jae Hong Yoon, Tong Yul Cho, Yun Kon Joo & Chan Gyu Lee

Authors
  1. Junqing Lu
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Jae Hong Yoon
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Tong Yul Cho
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. Yun Kon Joo
    View author publications

    You can also search for this author in PubMed Google Scholar

  5. Chan Gyu Lee
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to Junqing Lu.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Lu, J., Yoon, J.H., Cho, T.Y. et al. Effects of pressure on metal atom transport and plasma properties during arc ion plating of TiAlN. Met. Mater. Int. 13, 123–128 (2007). https://doi.org/10.1007/BF03027562

Download citation

  • Issue Date:

  • DOI: https://doi.org/10.1007/BF03027562

Keywords

Search

Navigation