Abstract
Thin films of CuBiS2 have been deposited on glass substrates using spray pyrolysis technique. The effect of substrate temperature on the growth of CuBiS2 thin films is studied in the range of 150 to 400°C. The best quality films are grown at substrate temperature 250°C with 0·1 M composition. Other preparative parameters like spray rate, pressure, height of the solution, etc are optimized with respect to substrate temperature. Some optical and electrical properties of CuBiS2 films are also studied and reported.
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References
Austin I G, Goodman C H L and Pengelly A E 1956Electrochem. Soc. 103 609
Chamberlin R R and Skarman J S 1966J. Electrochem. Soc. 113 86
Feigelson R S, N’Dioye A, Yin Shaiw-Yih and Bube R-H 1977J. Appl. Phys. 48 3162
Mytton R J 1974Solar Energy 16 33
Pawar S H and Uplane M D 1983Solar Cell 10 177
Pawar S H, Bhosale P N, Uplane M D and Tamhankar S P 1983Thin Solid Films 110 165
Pawar S H, Uplane M D, Pawar S K and Desai J S 1985J. Shivaji Univ.
Rajebhosale M R and S H Pawar 1978J. Shivaji Univ. 18 45
Ugai Ya A, Semenov V N and Averbakh E M 1978Izv. Nauk SSIR, Neorgani Cheskie Materialy 14 1529
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Pawar, S.H., Pawar, A.J. & Bhosale, P.N. Spray pyrolytic deposition of CuBiS2 thin films. Bull. Mater. Sci. 8, 423–426 (1986). https://doi.org/10.1007/BF02744156
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DOI: https://doi.org/10.1007/BF02744156