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Oxidation of hafnium carbide and hafnium carbide with additions of tantalum and praseodymium

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Abstract

The oxidation behavior of HfC, HfC-25 wt. % TaC, and HfC-7 wt.% PrC2 has been studied between 1200–2200° C. Parabolic growth of the oxide layer has been observed for both HfC and HfC-TaC over the entire temperature range. A break in the temperature dependence of the oxidation kinetics occurs around 1600°C. At lower temperatures, the kinetics are limited by gaseous diffusion via pores in the oxide. Above 1800°C, gaseous diffusion through pores becomes less important as scale-growth kinetics are dominated by bulk (ambipolar) diffusion of oxygen and electrons through the oxide.

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Author notes

  1. J. T. Prater

    Present address: Army Research Office, Research Triangle Park, North Carolina

  2. G. R. Holcomb

    Present address: U.S. Bureau of Mines, Albany, Oregon

Authors and Affiliations

  1. Pacific Northwest Laboratory, Richland, Washington

    E. L. Courtright

  2. Ohio State University, Columbus, Ohio

    G. R. St. Pierre & R. A. Rapp

Authors
  1. E. L. Courtright
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  2. J. T. Prater
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  3. G. R. Holcomb
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  4. G. R. St. Pierre
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  5. R. A. Rapp
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Courtright, E.L., Prater, J.T., Holcomb, G.R. et al. Oxidation of hafnium carbide and hafnium carbide with additions of tantalum and praseodymium. Oxid Met 36, 423–437 (1991). https://doi.org/10.1007/BF01151590

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  • DOI: https://doi.org/10.1007/BF01151590

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