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Near-Field Optical Litography

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Scanning Probe Microscopy in Nanoscience and Nanotechnology

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Summary

This chapter reviews a specific application of scanning near-field optical microscopy (SNOM) to lithography. The working principles of the conventional lithographic techniques and related materials as well as of the SNOM technique are recalled. Detailed results of the aperture and apertureless scanning near-field optical lithography (SNOL) with regard to resolution and effectiveness of the method are dealt with. In particular, attention is focused on SNOL results on azo-polymers. The photo-printing mechanism of those polymers has in return allowed the study of the near-field fundamental features as well as of the probes.

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Authors and Affiliations

  1. Department of Physics, University of Messina, Salita Sperone 31, 98166, Messina, Italy

    Eugenio Cefalì

  2. Dipartimento di Fisica della Materia e Ingegneria Elettronica, Università di Messina, Salita Sperone 31, 98100, Messina, Italy

    Salvatore Patanè

  3. Dipartimento di Fisica “E. Fermi”, Universitá di Pisa and CNISM, Largo Pontecorvo 3, 56127, Pisa, Italy

    Maria Allegrini

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  1. Eugenio Cefalì
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  2. Salvatore Patanè
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  3. Maria Allegrini
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Correspondence to Eugenio Cefalì .

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  1. Nanoprobe Lab. Bio- & Nanotechnology &, Ohio State University, West 19th Avenue 201, Columbus, 43210-1142, U.S.A.

    Bharat Bhushan

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Cefalì, E., Patanè, S., Allegrini, M. (2010). Near-Field Optical Litography. In: Bhushan, B. (eds) Scanning Probe Microscopy in Nanoscience and Nanotechnology. NanoScience and Technology. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-03535-7_21

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