Abstract
The physical bases of surface chemical analysis techniques are described in the context of semiconductor analysis. Particular emphasis is placed on the GlossaryTerm
SIMS
(secondary ion mass spectrometry) technique, as this is one of the more useful tools for routine semiconductor characterization. The practical application of these methods is addressed in preference to describing the frontiers of current research.This is a preview of subscription content, log in via an institution to check access.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2017 Springer International Publishing AG
About this chapter
Cite this chapter
Sykes, D. (2017). Surface Chemical Analysis. In: Kasap, S., Capper, P. (eds) Springer Handbook of Electronic and Photonic Materials. Springer Handbooks. Springer, Cham. https://doi.org/10.1007/978-3-319-48933-9_18
Download citation
DOI: https://doi.org/10.1007/978-3-319-48933-9_18
Published:
Publisher Name: Springer, Cham
Print ISBN: 978-3-319-48931-5
Online ISBN: 978-3-319-48933-9
eBook Packages: Chemistry and Materials ScienceChemistry and Material Science (R0)