• Rapid Communication

Valley splitting of SiSi1xGex heterostructures in tilted magnetic fields

K. Lai, T. M. Lu, W. Pan, D. C. Tsui, S. Lyon, J. Liu, Y. H. Xie, M. Mühlberger, and F. Schäffler
Phys. Rev. B 73, 161301(R) – Published 7 April 2006

Abstract

We have investigated the valley splitting of two-dimensional electrons in high-quality SiSi1xGex heterostructures under tilted magnetic fields. For all the samples in our study, the valley splitting at filling factor ν=3 (Δ3) is significantly different before and after the coincidence angle, at which energy levels cross at the Fermi level. On both sides of the coincidence, a linear dependence of Δ3 on the electron density was observed, while the slope of these two configurations differs by more than a factor of 2. We argue that screening of the Coulomb interaction from the low-lying filled levels, which also explains the observed spin-dependent resistivity, is responsible for the large difference of Δ3 before and after the coincidence.

  • Figure
  • Figure
  • Figure
  • Figure
  • Received 27 January 2006

DOI:https://doi.org/10.1103/PhysRevB.73.161301

©2006 American Physical Society

Authors & Affiliations

K. Lai1, T. M. Lu1, W. Pan2, D. C. Tsui1, S. Lyon1, J. Liu3, Y. H. Xie3, M. Mühlberger4, and F. Schäffler4

  • 1Department of Electrical Engineering, Princeton University, Princeton, New Jersey 08544, USA
  • 2Sandia National Laboratories, Albuquerque, New Mexico 87185, USA
  • 3Department of Material Science and Engineering, UCLA, Los Angeles, California 90095, USA
  • 4Institut für Halbleiterphysik, Universität Linz, A-4040 Linz, Austria

Article Text (Subscription Required)

Click to Expand

References (Subscription Required)

Click to Expand
Issue

Vol. 73, Iss. 16 — 15 April 2006

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×