Abstract
The carrier generation at the silicon–lead-borosilicate-glass interface is studied by the method of pulsed MIS capacitor. It is shown that the temperature dependence of the surface generation velocity is governed by the tunnel and tunnel-activated charge-state alteration of glass traps located near the interface.
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Vlasov, S.I., Parchinskii, P.B. & Ligai, L.G. Temperature Dependence of Carrier Generation at the Silicon–Lead-Borosilicate-Glass Interface. Russian Microelectronics 32, 95–96 (2003). https://doi.org/10.1023/A:1022652002047
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DOI: https://doi.org/10.1023/A:1022652002047